![]() |
Mu-Metal ChambersWhen considering the design and use of chambers where stray magnetic
fields can be an experimental; problem (namely electron spectroscopy),
is is worth considering mu-metal as a possibility. |
![]() |
Design for Effective ScreeningMu-metal vessels provide an internal volume with low residual magnetic field (typically <5 milligaus) and are desirable on experimental systems involving low energy electrons (<100ev). These experiments generally demand a number of probes and detectors, requiring many ports on the vacuum vessel. A hole made in the mu-metal envelope destroys the shielding effectiveness. The penetration from the external field extends internally to a distance approximately equal to the hole diameter. With a length at least equal to its diameter. The solution is to provide a mu-metal port on the vacuum vessel with a length at least equal to its diameter. Bell-jar type chambers must be fitted with a perforated mu-metal base plate to allow for pumping and provide access for drives, feedthroughs, etc. There must be substantial mu-metal to overlap between the base plate and the chamber walls and the mu-metal / mu-metal contact should be as tight as possible to form a complete magnetic circuit. |
Chamber FabricationMu-metal/ mu-metal welds are relatively straightforward if the material has been processed correctly. After welding, the chamber is annealed with a vacuum bake to 1100oC to restore the magnetic permeability. This precludes the fitting of the conflat flanges before baking as the knife edges would soften to an unacceptable extent. Therefore the flanges are welded on at the final stage of fabrication, including the following measures:
|
|
|
|